Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon
dc.contributor.author | Schneider, J. | |
dc.contributor.author | Ziegler, T. | |
dc.contributor.author | Wagenpfeil, M. | |
dc.date.accessioned | 2021-09-21T21:38:02Z | |
dc.date.available | 2021-09-21T21:38:02Z | |
dc.date.issued | 2021 | |
dc.identifier.citation | Wagenpfeil, M. & Ziegler, T. & Schneider, J. & Fieguth, A. & Murra, M. & Schulte, Denny & Althueser, L. & Huhmann, C. & Weinheimer, C. & Michel, Tayoumkam & Anton, G. & Adhikari, G. & Kharusi, S. & Angelico, E. & Arnquist, I. & Badhrees, I. & Bane, J. & Beck, D. & Belov, Vladimir. (2021). Reflectivity of VUV-sensitive Silicon Photomultipliers in Liquid Xenon. | en_US |
dc.identifier.issn | 1748-0221 | |
dc.identifier.uri | 10.1088/1748-0221/16/08/P08002 | |
dc.identifier.uri | http://hdl.handle.net/10566/6746 | |
dc.description.abstract | Silicon photomultipliers are regarded as a very promising technology for nextgeneration, cutting-edge detectors for low-background experiments in particle physics. This work presents systematic reflectivity studies of Silicon Photomultipliers (SiPM) and other samples in liquid xenon at vacuum ultraviolet (VUV) wavelengths. A dedicated setup at the University of Münster has been used that allows to acquire angle-resolved reflection measurements of various samples immersed in liquid xenon with 0 45 angular resolution. Four samples are investigated in this work: one Hamamatsu VUV4 SiPM, one FBK VUV-HD SiPM, one FBK wafer sample and one Large-Area Avalanche Photodiode (LA-APD) from EXO-200. | en_US |
dc.language.iso | en | en_US |
dc.publisher | IOP Publishing | en_US |
dc.subject | Photon detectors for UV | en_US |
dc.subject | IR photons | en_US |
dc.subject | APDs | en_US |
dc.subject | PIN diodes | en_US |
dc.subject | Solid state | en_US |
dc.title | Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon | en_US |
dc.type | Article | en_US |